Since the 1950s, optical thin films have developed rapidly in two aspects: coating technology and computer-aided design. In terms of coating, a series of new ion-based technologies have been researched and applied. In 1953, Auwarter of Germany applied for a patent for coating optical film by reactive evaporation and proposed to increase chemical reactivity with ionized gas. In 1964, Mattox launched an ion plating system based on previous research work. The ion system at that time worked under a pressure of 10Pa and a discharge voltage of 2KV, and was used to coat metals for wear-resistant and decorative purposes, and was not suitable for coating optical films. Later, research used high-frequency ion plating to deposit optical films on insulating materials such as glass. Since the 1970s, a series of new technologies such as ion-assisted deposition, reactive ion plating and other
ion chemical vapor phases have been researched and applied. Because they use energetic ions, they provide sufficient activation energy and increase the reaction speed of the surface. It improves the mobility of adsorbed atoms and avoids the formation of columnar microstructures, thereby improving the performance of the optical film to varying degrees, which is the research and development direction of the optical film manufacturing process.